島津近紅外、紫外可光分光光度計使用說明-UV3600ppt課件

1、UVVisibleNIRPMTInGaAsPbS165nm380nm780nm3300nm1651000nm7001800nm1600 3300nmPMTPMTPbSPbSInGaAsInGaAs0 020204040606080801001002002007007001200120017001700 2200220027002700 32003200PMTInGaAsPbSPbSInGaAsSensitivity CharacteristicWavelength (nm)Relative Value (%) 分辨率：分辨率：0.1nm 超低超低雜雜散光散光UV-3600PE 950220nm

2、(NaI)0.00008%0.00007%340nm(NaNO2)0.00005%0.00007% 測測定范定范圍圍:185nm3300nmIsolated -OHAggregated -OH204060C4H9-O-HC4H9-O-HC4H9-O-HH-O-H9C4注注) 傳統(tǒng)的積分球只有光電倍增管或光電倍增管傳統(tǒng)的積分球只有光電倍增管或光電倍增管PbS檢測器的積分球可以裝在檢測器的積分球可以裝在3600上，上，3600的積分球沒有包含的積分球沒有包含 InGaAs 檢測器，檢測器，MPC3100的積分球也不包含的積分球也不包含InGaAs檢測器檢測器UV-3600UV-3150Slit w

3、idth 2nm, RMS 1 sec.UV-Vis：0.00005A（500nm）NIR ：0.00008A（900nm）0.00003A(1500nm)About 18000nm/min（UV-Vis）About 2100nm/min（UV-Vis）About 70000nm/min（NIR）About 8200nm/min（NIR）(轉(zhuǎn)換時間除外)(轉(zhuǎn)換時間除外)Max：About 4500nm/min（UV-Vis）About 9000nm/min（NIRPMT/InGaAs）About 4000nm/min（NIRPbS）(轉(zhuǎn)換時間除外)0.00008%T (220nm、NaI)0.

4、00008%T(220nm、NaI)0.00005%T (340nm、NaNO2)0.00005%T (340nm、NaNO2)0.0005%T （1420nm、H2O）0.08%T (1690,2740nm)0.005%T (2365nm、CHCl3)分辨率-0.1nm0.1nmUV/VIS:0.2nmUV/VIS:0.3nmNIR: 0.8nmNIR: 1.6nmUV/VIS:0.08nmUV/VIS:0.1nmNIR:0.32nmNIR: 0.4nm光度范圍 -66Abs-45Abs. 0.003A(1A)0.004A(1A)0.002A(0.5A)0.002A(0.5A)0.0008A

5、（00.5A）0.001A(0-0.5A)0.0016A(0.51A)0.002A（0.5-1A）1 sec. integration, Standard Deviation from 50.001A（2003000nm）0.001A(210800nm、Slit 2nm)Slit 5nm0.002A（8003000nm、Slit 5nm）基線穩(wěn)定性within 0.0002A/hwithin 0.0004A/h光學(xué)系統(tǒng)單色器：2-2光柵雙單色器檢測器：PMT、InGaAs、Cooled PbS（-10）單色器：3-3 光柵雙單色器Detector：PMT、PbSN/A基線平滑度波長準確性波長重

6、復(fù)性波長準確度波長掃描速度1600nm/min MAX波長重復(fù)性噪音波長轉(zhuǎn)化速度雜散光Academic37%Government14%Chemical14%Electronic12%Optical5%Others9%Analytical2%Machine2%Glass5%Chemical43%Material10%Electronic8%Physics6%Unknown18%Others5%Machine4%Biology4%Metal1%Agricalture1%ShimadzuHitachiUV-3600U-4100(liquid)PMTPMTPMT 928PMT 928PMT 6872P

7、MT 6872InGaAs Detector可冷卻型 PbS可冷卻型 PbS (0C)可冷卻型 PbS (0C)可冷卻型可冷卻型 PbS 可冷卻型PbS (-10C)波長范圍波長范圍B185-3300nmB185-3300nmA175 - 3300nmA175-1800A175 - 900A175 - 3300nm(185nm以下需氮氣吹掃)(185nm以下需氮氣吹掃)(185nm以下需氮氣吹掃)(185nm以下需氮氣吹掃)B0.00008%T(220nm, NaI)D0.0001%T (220nm,NaI)-0.00008%T(220nm, NaI)A0.00008%T(220nm, NaI

8、)A0.00007%TA0.00007%TA0.00005%T(340nm, NaNO2)0.0001%T (340nm,NaNO2)A (220nm, NaI, ASTM)A (220nm, NaI, ASTM)B0.0005%T(1420nm, H2O)0.025%T (1690nm,CHCl3)A0.0002% (1420nm,H2O-10mm)A0.0001% (1420nm,H2O-10mm)0.00040%T0.00040%TB0.005%T (2365nm,CHCl3)A0.00045%T(2365nm, CHCl3) (1420nm, H2O-10mm)AA0.00050%T(

9、2365nm, CHCl3)UV/VIS: 0.1-8nmUV/VIS: 0.01-8.00nmUV/VIS: 0.01-5.00nmUV/VIS: 0.01-5.00nmUV/VIS: 0.05-5.00nmUV/VIS: 0.05-5.00nm8-step 可調(diào) (0.1, 0.2,0.5, 1, 2, 3, 5, 8nm) 0.01 (0.02) nm 調(diào)整 0.01nm 調(diào)整 0.01nm 調(diào)整 0.01nm 調(diào)整 0.01nm 調(diào)整NIR: 0.2-32nmNIR: 0.1-20nmNIR: 0.04-20nmNIR: 0.02-10nmNIR: 0.2-20nm10-step 可 調(diào) (0.2,0.5, 1, 2, 3, 5, 8, 12,20, 32nm)0.1nm 調(diào)整 0.01nm 調(diào)整 0.01nm 調(diào)整 0.04nm 調(diào)整Auto control + fixedFixed + constantenergy + slit programFixed + constantenergy + slit programA8 Abs (with RBA)A8Abs (with SRATT)AA8Abs (with RBA